Electron mobility in surface-and buried-channel flatband In0.53Ga0.47As MOSFETs with ALD Al2O3 gate dielectric
S.J. Bently, M. Holland, X. Li, G.W. Paterson, H. Zhou, O. Ignatova, D. Macintyre, S. Thoms, A. Asenov, B. Shin, J. Ahn, P.C. Mclntyre, I. G. Thayne
IEEE Electron Device Letters
32,
494 (2011)
(Before KAIST)